Produktbild: Atomic Layer Deposition of Nanostructured Materials

Atomic Layer Deposition of Nanostructured Materials

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Beschreibung

Produktdetails

Einband

Gebundene Ausgabe

Erscheinungsdatum

23.11.2011

Abbildungen

farbige Illustrationen, Tabellen, schwarz-weiss, schwarz-weiss Illustrationen

Herausgeber

Nicola Pinna + weitere

Verlag

Wiley-VCH

Seitenzahl

472

Maße (L/B/H)

25.4/18.2/2.8 cm

Gewicht

1028 g

Auflage

1. Auflage

Sprache

Englisch

ISBN

978-3-527-32797-3

Beschreibung

Portrait

Nicola Pinna studied physical chemistry at the Université Pierre et Marie Curie (Paris). He received his PhD in 2001, and in 2002, he moved to the Fritz Haber Institute of the Max Planck Society (Berlin). In 2003, he joined the Max Planck Institute of Colloids and Interfaces (Potsdam). In 2005, he moved to the Martin Luther University, Halle-Wittenberg, as an Assistant Professor of Inorganic Chemistry. Since 2006 he is researcher at the Department of Chemistry and CICECO of the University
of Aveiro and since 2009 he is also Assistant Professor at the School of Chemical and Biological Engineering of the Seoul National University. In 2011 he was ranked among the top 100 materials scientists of the past decade by impact. His research activity is focused on the development of novel routes to nanostructured materials, their characterization, and the study of their physical properties.

Mato Knez studied chemistry at the University of Ulm in Germany. He did his dissertation at the Max Planck Institute of solid state research in Stuttgart from 2000-2003. In 2003 he joined the Max Planck Institute for Microstructure Physics in Halle as a Postdoc where he established the ALD-based research direction. Since 2006 he is leading a research group funded by the German Ministry of Education and Research (BMBF). In January 2012 he will join CIC nanoGUNE in San Sebastian (Spain) as an Ikerbasque Research Professor. His research activities are mainly focused on various aspects of the application of ALD, including the synthesis of optical nanolaminates, infi ltration mechanisms when ALD is applied to soft materials, and ALD-assisted nanofabrication of photonic and plasmonic structures. Aside from ALD he has strong research activites in biotemplated inorganic nanostructures for applications in nanotechnology and medicine.

Produktdetails

Einband

Gebundene Ausgabe

Erscheinungsdatum

23.11.2011

Abbildungen

farbige Illustrationen, Tabellen, schwarz-weiss, schwarz-weiss Illustrationen

Herausgeber

Verlag

Wiley-VCH

Seitenzahl

472

Maße (L/B/H)

25.4/18.2/2.8 cm

Gewicht

1028 g

Auflage

1. Auflage

Sprache

Englisch

ISBN

978-3-527-32797-3

Herstelleradresse

Wiley-VCH GmbH
Boschstr. 12
69469 Weinheim
Deutschland
Email: trade@wiley.com
Url: www.wiley-vch.de
Fax: +49 6201 606328

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Die Leseprobe wird geladen.
  • Produktbild: Atomic Layer Deposition of Nanostructured Materials
  • PART I: Introduction to ALD

    THEORETICAL MODELING OF ALD PROCESSES
    Introduction
    Overview of Atomistic Simulations
    Calculation of Properties Using Quantum Simulations
    Prediction of ALD Chemical Mechanisms
    Example of a Calculated ALD Mechanism: ALD of Al2O3 Using TMA and Water

    STEP COVERAGE IN ALD
    Introduction
    Growth Techniques
    Step Coverage Models in ALD
    Experimental Verifications of Step Coverage Models
    Summary

    PRECURSORS FOR ALD PROCESSES
    Introduction
    General Requirements for ALD Precursors
    Metallic Precursors for ALD
    Nonmetal Precursors for ALD
    Conclusions

    SOL-GEL CHEMSTRY AND ATOMIC LAYER DEPOSITION
    Aqueous and Nonaqueous Sol-Gel in Solution
    Sol-Gel and ALD: An Overview
    Mechanistic and In Situ Studies

    MOLECULAR LAYER DEPOSITION OF HYBRID ORGANIC-INORGANIC FILMS
    Introduction
    General Issues for MLD of Hybrid Organic-Inorganic Films
    MLD Using Trimethylaluminum and Ethylene Glycol in an AB Process
    Expansion to an ABC Process Using Heterobifunctional and Ring-Opening Precursors
    Use of a Homotrifunctional Precursor to Promote Cross-Linking in an AB Process
    MLD of Hybrid Alumina-Siloxane Films Using an ABCD Process
    Future Prospects for MLD of Hybrid Organic-Inorganic Films´

    LOW-TEMPERATURE ATOMIC LAYER DEPOSITION
    Introduction
    Challenges of LT-ALD
    Materials and Processes
    Toward Novel LT-ALD Processes
    Thin Film Gas Diffusion Barriers
    Encapsulation of Organic Electronics
    Conclusions

    PLASMA ATOMIC LAYER DEPOSITION
    Introduction
    Plasma Basics
    Plasma ALD Configurations
    Merits of Plasma ALD
    Challenges for Plasma ALD
    Concluding Remarks and Outlook

    PART II: Nanostructures by ALD

    ATOMIC LAYER DEPOSITION FOR MICROELECTRONIC APPLICATIONS
    Introduction
    ALD Layers for Memory Devices
    ALD for Logic Devices
    Concluding Remarks

    NANOPATTERNING BY AREA-SELECTIVE ATOMIC LAYER DEPOSITION
    Concept of Area-Selective Atomic Layer Deposition
    Change of Surface Properties
    Patterning
    Applications of AS-ALD
    Current Challenges

    COATINGS ON HIGH ASPECT RATIO STRUCTURES
    Introduction
    Models and Analysis
    Characterization Methods for ALD Coatings in High Aspect Ratio Structures
    Examples of ALD in High Aspect Ratio Structures
    Nonideal Behavior during ALD in High Aspect Ratios
    Conclusions and Future Outlook

    COATINGS OF NANOPARTICLES AND NANOWIRES
    ALD on Nanoparticles
    Vapor-Liquid-Solid Growth of Nanowires by ALD
    Atomic Layer Epitaxy on Nanowires
    ALD on Semiconductor NWs for Surface Passivation
    ALD-Assisted Formation of Nanopeapods
    Photocorrosion of Semiconductor Nanowires Capped by ALD Shell
    Interface Reaction of Nanowires with ALD Shell
    ALD ZnO on NWs/Tubes as Seed Layer for Growth of Hyperbranch
    Conclusions

    ATOMIC LAYER DEPOSITION ON SOFT MATERIALS
    Introduction
    ALD on Polymers for Passivation, Encapsulation, and Surface Modification
    ALD for Bulk Modification of Natural and Synthetic Polymers and Molecules
    ALD for Polymer Sacrificial Templating: Membranes, Fibers, and Biological and Optical Structures
    ALD Nucleation of Patterned and Planar SAMs and Surface Oligomers
    Reactions during Al2O3 ALD on Representative Polymer Materials
    Summary

    APPLICATION OF ALD TO BIOMATERIALS AND BIOCOMPATIBLE COATINGS
    Application of ALD to Biomaterials
    Biocompatible Coatings
    Summary

    COATING OF CARBON NANOTUBES
    Introduction
    Purification and Surface Functionalization of Carbon Nanotubes
    Decoration/Coating of Carbon Nanotubes by Solution Routes
    Decoration/Coating of Carbon Nanotubes by Gas-Phase Techniques
    Atomic Layer Deposition on Carbon Nanotubes
    Coating of Large Quantity of CNTs by ALD
    ALD Coating of Other sp2-Bonded Carbon Materials
    Conclusions

    INVERSE OPAL PHOTONICS
    Introduction and Background
    Properties of Three-Dimensional Photonic Band Structures
    Large-Pore and Non-Close-Packed Inverse Opals
    Experimental Studies
    Tunable PC Structures
    Summary

    NANOLAMINATES
    Introduction
    Optical Applications
    Thin Film Encapsulation
    Applications in Electronics
    Copper Electroplating Applications
    Solid Oxide Fuel Cells
    Complex Nanostructures
    Summary

    CHALLENGES IN ATOMIC LAYER DEPOSITION
    Introduction
    Metals
    Nonmetal Elements
    Binary Compounds
    Ternary and Quaternary Compounds
    Nucleation
    Conclusions

    General Introduction to ALD and New Challenges
    Theroretical Modeling of ALD Processes
    New Chemical Approaches to ALD
    Polymer and Hybrid ALD (MLD)
    Low Temperature ALD Processes
    PART 2: NANOSTRUCTURES BY ATOMIC LAYER DEPOSITION
    ALD in Microelectronics
    Patterning and Linear Structures
    Coating of High Aspect Ratio Structures
    Coatings of Nanoparticles
    Coatings of Soft Materials
    Coatings of Carbon Nanotubes
    Inverse Opals and Photonics
    Optical Nanolaminates
    ALS on Biological Materials