• Produktbild: Amorphous and Crystalline Silicon Carbide and Related Materials
  • Produktbild: Amorphous and Crystalline Silicon Carbide and Related Materials
Band 34

Amorphous and Crystalline Silicon Carbide and Related Materials Proceedings of the First International Conference, Washington DC, December 10 and 11, 1987

Fr. 137.00

inkl. gesetzl. MwSt., Versandkostenfrei


Beschreibung

Produktdetails

Einband

Taschenbuch

Erscheinungsdatum

19.01.2012

Herausgeber

Gary L. Harris + weitere

Verlag

Springer Berlin

Seitenzahl

199

Maße (L/B/H)

24.4/17/1.2 cm

Gewicht

382 g

Auflage

1989

Sprache

Englisch

ISBN

978-3-642-93408-7

Beschreibung

Produktdetails

Einband

Taschenbuch

Erscheinungsdatum

19.01.2012

Herausgeber

Verlag

Springer Berlin

Seitenzahl

199

Maße (L/B/H)

24.4/17/1.2 cm

Gewicht

382 g

Auflage

1989

Sprache

Englisch

ISBN

978-3-642-93408-7

Herstelleradresse

Springer-Verlag KG
Sachsenplatz 4-6
1201 Wien
AT

Email: GPSR Kontakt

Noch keine Bewertungen vorhanden

Verfassen Sie die erste Bewertung zu diesem Artikel

Helfen Sie anderen Kundinnen und Kunden durch Ihre Meinung.

Kundinnen und Kunden meinen

Bewertungen (0)

  • Produktbild: Amorphous and Crystalline Silicon Carbide and Related Materials
  • Produktbild: Amorphous and Crystalline Silicon Carbide and Related Materials
  • I Growth of Crystalline Silicon Carbide.- Recent Developments in SiC (USA).- 6H-SiC Studies and Developments at the Corporate Research Laboratory of Siemens AG and the Institute for Applied Physics of the University in Erlangen (FRG).- VPE Growth of SiC on Step-Controlled Substrates.- Growth of ?-SiC Heteroepitaxial Films on Vicinal (001) Si Substrates.- Epitaxial Growth of 3C-SiC on a Si Substrate Using Methyltrichlorosilane.- A Mechanism and Kinetics for Silicon Carbide Growth.- Mechanisms of Epitaxial Growth of ?-SiC on Silicon Substrate by Chemical Vapor Deposition and Nucleation of Defects.- II Growth of Amorphous Silieon Carbide.- Present and Future Applications of Amorphous Silicon Carbide.- Fabrication of a-Si:H/a-SiC:H Multilayers by a Glow Discharge Method and Carrier Transport Properties.- Highly Photosensitive a-SiC:H Films Prepared at High Deposition Rate by Glow Discharge in SiH4-C2H2 Mixture Gas.- A Novel L-Coupled RF PECVD System for Large-Area Deposition of a-SiC:H for Device Applications.- III Characterization of Silicon Carbide.- Donor Identification in Thin Film Cubic SiC.- SiC Production Chemistry from Olefinic Hydrocarbons on Si(100).- Surface Structures of ?-SiC, 6H-SiC and Pseudomorphic Si Adlayers.- Study of the Origin of Residual Carriers in CVD-Grown 3C-SiC by Photoluminescence and Electron Spin Resonance.- Phase Matched Second Harmonic Conversion in ?-SiC.- Gamma-Ray Irradiation Effects on 3C-SiC Devices.- The Measurement of Stress in Silicon Carbide Using the Photoelastic Effect.- Effect of Surface Modifications of Cubic SiC on Metallization Interactions.- Amorphous Silicon Carbide Thin Films Produced in the Glow Discharge Deposition System.- Preparation and Properties of Polycrystalline Silicon Carbide Films Produced by Plasma Enhanced Chemical Vapor Deposition, and Their Applications.- IV Silicon Carbide Processing and Device Applications.- Study on Current Gain Degradation in Amorphous SiC Emitter HBT.- Investigations of Stability of a-SiC Under Heat Treatment During Device Fabrication.- Heterojunction Band Discontinuities in Crystalline Silicon/Amorphous Compound Heterojunctions.- Amorphous Silicon Solar Cells Using a-SiC Materials.- Au-Ni Contacts on ?-SiC Films.- Epitaxial Growth, High Temperature Ion Implantation and MOSFET Fabrication in Monocrystalline ?-SiC Thin Films.- Plasma-Assisted Chemical Vapor Deposition of Cubic Silicon Carbide on Silicon Substrate.- Reactive Ion Etching for SiC Device Fabrication.- Index of Contributors.