Beschreibung
Produktdetails
Einband
Gebundene Ausgabe
Erscheinungsdatum
09.02.2015
Herausgeber
Burton KohlerVerlag
ML Books International - IPSSeitenzahl
260
Maße (L/B/H)
23.5/15.7/1.9 cm
Gewicht
532 g
Sprache
Englisch
ISBN
978-1-63238-016-6
This book presents state-of-the-art information regarding the extensive field of advanced lithography. Advanced lithography expands into numerous sub-fields like micro electro-mechanical system (MEMS), nano-lithography, nano-physics, etc. In optimized electron device, nano-lithography reaches up to 20 nm in size. Subsequently, we have to analyze and develop true single nanometer size lithography. One of the solutions is to analyze a fusion of bottom up and top down technologies like EB drawing and self-assembly with block copolymer. In nano-photonics and MEMS, 3D structures are required for carrying out specific functions in the devices for applications. They are formed as a result of execution of numerous techniques like stereo-lithography, sputtering, colloid lithography, deposition, dry etching, etc. This book provides the readers with valuable information about nano structure, 3D structure, nano-lithography, and elucidates the methodology, techniques and applications of nano-lithography.
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